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Advanced Nanoscale MOSFET Architectures (Record no. 66868)

MARC details
000 -LEADER
fixed length control field 03574nam a22003974u 4500
001 - CONTROL NUMBER
control field 10.1002/9781394188970
003 - CONTROL NUMBER IDENTIFIER
control field Wiley
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20251030120303.0
007 - PHYSICAL DESCRIPTION FIXED FIELD--GENERAL INFORMATION
fixed length control field cr nn 008mam|a
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 240528t2024||||xxu fs| |0|| 0|eng||
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9781394188970
Qualifying information electronic
024 7# - OTHER STANDARD IDENTIFIER
Standard number or code 10.1002/9781394188970
Source of number or code doi
041 ## - LANGUAGE CODE
Language code of text/sound track or separate title eng
245 00 - TITLE STATEMENT
Title Advanced Nanoscale MOSFET Architectures
Remainder of title Current Trends and Future Perspectives
Medium [electronic resource]
Statement of responsibility, etc. Edited by Kalyan Biswas, Angsuman Sarkar.
250 ## - EDITION STATEMENT
Edition statement 1
260 ## - Date publicare
Name of publisher, distributor, etc. Wiley
Date of publication, distribution, etc. 2024
264 #1 - PRODUCTION, PUBLICATION, DISTRIBUTION, MANUFACTURE, AND COPYRIGHT NOTICE
Name of producer, publisher, distributor, manufacturer Wiley
Date of production, publication, distribution, manufacture, or copyright notice 2024
300 ## - PHYSICAL DESCRIPTION
Extent 336pp.;
336 ## - CONTENT TYPE
Content type term text
Content type code txt
Source rdacontent
337 ## - MEDIA TYPE
Media type term computer
Media type code c
Source rdamedia
338 ## - CARRIER TYPE
Carrier type term online resource
Carrier type code cr
Source rdacarrier
347 ## - DIGITAL FILE CHARACTERISTICS
File type text file
Source rdaft
347 ## - DIGITAL FILE CHARACTERISTICS
Encoding format PDF
520 ## - SUMMARY, ETC.
Summary, etc. Comprehensive reference on the fundamental principles and basic physics dictating metal-oxide-semiconductor field-effect transistor (MOSFET) operation Advanced Nanoscale MOSFET Architectures provides an in-depth review of modern metal-oxide-semiconductor field-effect transistor (MOSFET) device technologies and advancements, with information on their operation, various architectures, fabrication, materials, modeling and simulation methods, circuit applications, and other aspects related to nanoscale MOSFET technology. The text begins with an introduction to the foundational technology before moving on to describe challenges associated with the scaling of nanoscale devices. Other topics covered include device physics and operation, strain engineering for highly scaled MOSFETs, tunnel FET, graphene based field effect transistors, and more. The text also compares silicon bulk and devices, nanosheet transistors and introduces low-power circuit design using advanced MOSFETs. Additional topics covered include: High-k gate dielectrics and metal gate electrodes for multi-gate MOSFETs, covering gate stack processing and metal gate modification Strain engineering in 3D complementary metal-oxide semiconductors (CMOS) and its scaling impact, and strain engineering in silicon-germanium (SiGe) FinFET and its challenges and future perspectives TCAD simulation of multi-gate MOSFET, covering model calibration and device performance for analog and RF applications Description of the design of an analog amplifier circuit using digital CMOS technology of SCL for ultra-low power VLSI applications Advanced Nanoscale MOSFET Architectures helps readers understand device physics and design of new structures and material compositions, making it an important resource for the researchers and professionals who are carrying out research in the field, along with students in related programs of study.
650 #4 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element
9 (RLIN) 91126
650 #4 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element
9 (RLIN) 69883
650 #4 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name as entry element
9 (RLIN) 91127
653 00 - INDEX TERM--UNCONTROLLED
Uncontrolled term nanoscale MOSFET; FinFET; graphene; GaN; TCAD; RF analog performance; semiconductors; High-k gate dielectrics; metal gate electrodes; multi-gate MOSFETs; gate stack processing; metal gate modification; heterostructure MOSFET
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Biswas, Kalyan
Relator code edt
9 (RLIN) 91128
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Sarkar, Angsuman
Relator code edt
9 (RLIN) 40022
776 08 - ADDITIONAL PHYSICAL FORM ENTRY
Relationship information Printed edition:
International Standard Book Number 9781394188949
856 40 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier <a href="https://doi.org/10.1002/9781394188970">https://doi.org/10.1002/9781394188970</a>
Host name Wiley Online Library
856 40 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier <a href="https://onlinelibrary.wiley.com/action/showBook?doi=10.1002%2F9781394188970">https://onlinelibrary.wiley.com/action/showBook?doi=10.1002%2F9781394188970</a>
Host name Wiley Online Library
856 42 - ELECTRONIC LOCATION AND ACCESS
Materials specified Cover Image
Uniform Resource Identifier <a href="https://onlinelibrary.wiley.com/cms/asset/602ee35e-dbc9-40e6-87bf-10a6b57f8e82/9781394188970.cover.gif">https://onlinelibrary.wiley.com/cms/asset/602ee35e-dbc9-40e6-87bf-10a6b57f8e82/9781394188970.cover.gif</a>
Host name Wiley Online Library

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