<?xml version="1.0" encoding="utf-8" ?> <rss version="2.0" xmlns:opensearch="http://a9.com/-/spec/opensearch/1.1/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:atom="http://www.w3.org/2005/Atom"> <channel> <title> <![CDATA[Biblioteca Universității &quot;Dunărea de Jos&quot; Search for 'an:95921']]> </title> <!-- prettier-ignore-start --> <link> https://opac.ugal.ro/cgi-bin/koha/opac-search.pl?q=ccl=an%3A95921&#38;sort_by=relevance&#38;format=rss </link> <!-- prettier-ignore-end --> <atom:link rel="self" type="application/rss+xml" href="https://opac.ugal.ro/cgi-bin/koha/opac-search.pl?q=ccl=an%3A95921&#38;sort_by=relevance&#38;format=rss" /> <description> <![CDATA[ Search results for 'an:95921' at Biblioteca Universității &quot;Dunărea de Jos&quot;]]> </description> <opensearch:totalResults>2</opensearch:totalResults> <opensearch:startIndex>0</opensearch:startIndex> <opensearch:itemsPerPage>50</opensearch:itemsPerPage> <atom:link rel="search" type="application/opensearchdescription+xml" href="https://opac.ugal.ro/cgi-bin/koha/opac-search.pl?q=ccl=an%3A95921&#38;sort_by=relevance&#38;format=opensearchdescription" /> <opensearch:Query role="request" searchTerms="q%3Dccl%3Dan%253A95921" startPage="" /> <item> <title> Raman scattering on emerging semiconductors and oxides / </title> <dc:identifier>ISBN:9781032644912 | 1032644915 | 9781040105795 | 1040105793 | 9781040105818 | 1040105815</dc:identifier> <!-- prettier-ignore-start --> <link>https://opac.ugal.ro/cgi-bin/koha/opac-detail.pl?biblionumber=68213</link> <!-- prettier-ignore-end --> <description> <![CDATA[ <p> By Feng, Zhe Chuan,.<br /> .<br /> 1 online resource 9781032644912 | 1032644915 | 9781040105795 | 1040105793 | 9781040105818 | 1040105815 </p> ]]> <![CDATA[ <p> <a href="https://opac.ugal.ro/cgi-bin/koha/opac-reserve.pl?biblionumber=68213">Place hold on <em>Raman scattering on emerging semiconductors and oxides /</em></a> </p> ]]> </description> <guid>https://opac.ugal.ro/cgi-bin/koha/opac-detail.pl?biblionumber=68213</guid> </item> <item> <title> Handbook of silicon carbide materials and devices / </title> <dc:identifier>ISBN:9780429198540 | 042919854X | 9780429579837 | 0429579837 | 9780429583957 | 0429583958 | 9780429582059 | 0429582056</dc:identifier> <!-- prettier-ignore-start --> <link>https://opac.ugal.ro/cgi-bin/koha/opac-detail.pl?biblionumber=68303</link> <!-- prettier-ignore-end --> <description> <![CDATA[ <p> .<br /> 1 online resource (xix, 444 pages) : 9780429198540 | 042919854X | 9780429579837 | 0429579837 | 9780429583957 | 0429583958 | 9780429582059 | 0429582056 </p> ]]> <![CDATA[ <p> <a href="https://opac.ugal.ro/cgi-bin/koha/opac-reserve.pl?biblionumber=68303">Place hold on <em>Handbook of silicon carbide materials and devices /</em></a> </p> ]]> </description> <guid>https://opac.ugal.ro/cgi-bin/koha/opac-detail.pl?biblionumber=68303</guid> </item> </channel> </rss>
